Application of Oxide Layer Formed by Nitric Acid Oxidation of Si (NAOS) Method to Ultra-low Power CPU on Glass and Eternal Memory “Digital Rosetta Stone”

Presentation information

Regular sessions(Oral presentation)

13. Semiconductors A (Silicon) » 13.6 Silicon devices / Integration technology

Thu. Mar 28, 2013 9:00 AM - 11:45 AM G9 (B5 2F-2203)

^○Taketoshi Matsumoto¹, Tomoki Akai¹, Shigeki Imai¹, Hikaru Kobayashi¹ (ISIR, Osaka Univ., CREST-JST¹)

Keywords:硝酸、シリコン、メモリ