[18p-F2-1~13] 7.3 Lithography

[18p-F2-10] Development of "Shot level beam performance monitoring system" technology for ArF eximer lasers for semiconductor lithography tools

^○Yoshinobu Watabe¹, Masato Moriya¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Akihiko Kurosu¹, Takeshi Ohta¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (GIGAPHOTON INC.¹)

Keywords:エキシマレーザ,光品位,計測装置