[18p-F2-1~13] 7.3 Lithography

Tue. Mar 18, 2014 2:00 PM - 5:45 PM F2 (F204)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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2:00 PM - 2:30 PM

[18p-F2-1] [INVITED]Development of EUV evaluation tools for EUV mask in NewSUBARU

^○Tetsuo Harada^1,2, Takeo Watanabe^1,2, Hiroo Kinoshita^1,2 (Univ. of Hyogo¹, CREST/JST²)

2:30 PM - 2:45 PM

[18p-F2-2] Chemical reaction analysis of chemical amplified EUV resist by evaluating the thickness loss due to deprotection reaction

^○（M1）Kazuya Emura¹, Takeo Watanabe¹, Masato Yamaguchi¹, Hirohito Tanino¹, Tsubasa Hukui¹, Daiju Siono², Yuichi Haruyama¹, Yasuji Muramatu¹, Katsumi Ohmori², Kazufumi Sato², Tetsuo Harada¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹, Tokyo Ohka²)

2:45 PM - 3:00 PM

[18p-F2-3] Resolution improvement by low temperature development in non-chemically amplified EUV resist

^○masato yamaguchi¹, kazuya emura¹, tsubasa hukui¹, hirohito tanino¹, tetsuo harada¹, takeo watanabe¹, hiroo kinosita¹, ryoiti hosino² (Univercity of Hyogo¹, Gluon Lab²)

3:00 PM - 3:15 PM

[18p-F2-4] Removal mechanism of ion-implanted photoresists by the hydrogen radical generated using hot-wire catalyzer

Ryuichi Wakatsuki¹, Yusuke Noto¹, ^○Takashi Nishiyama¹, Eriko Sato², Hideo Horibe² (Kanazawa Inst. Tech.¹, Grad. Sch. of Eng., Osaka City Univ.²)

3:15 PM - 3:30 PM

[18p-F2-5] Photoresist Removal using Ozone Microbubble

Yosuke Goto¹, Hitomi Kitamura¹, ^○Takashi Nishiyama¹, Kunihiko Koike², Hideo Horibe³ (Kanazawa Inst. Tech.¹, Iwatani Corp.², Osaka City Univ.³)

3:30 PM - 3:45 PM

[18p-F2-6] Formation of randomly-aligned in-plane cylindrical domains of polystyrene-b-polydimethylsiloxane by thermal annealing method

^○Toru Yamaguchi¹, Akira Fujiwara¹ (NTT BRL¹)

Break 15:45〜16:00 (3:45 PM - 4:00 PM)

4:00 PM - 4:15 PM

△ [18p-F2-7] Built-in lens mask lithography I -Proposed and Basic study-

^○Naoki Ueda¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref Univ¹)

4:15 PM - 4:30 PM

[18p-F2-8] Built-in lens mask lithography -Experimental study-

^○Naoki Ueda¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref Univ¹)

4:30 PM - 4:45 PM

[18p-F2-9] Patterning Homogeneity of Projection Lithography Using a Gradient Index Lens Array

^○Toshiyuki Horiuchi¹, Naoki Takada², Hiroshi Kobayashi¹ (Tokyo Denki Univ.¹, Grad. Sch. Eng., Tokyo Denki Univ.²)

4:45 PM - 5:00 PM

[18p-F2-10] Development of "Shot level beam performance monitoring system" technology for ArF eximer lasers for semiconductor lithography tools

^○Yoshinobu Watabe¹, Masato Moriya¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Akihiko Kurosu¹, Takeshi Ohta¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (GIGAPHOTON INC.¹)

5:00 PM - 5:15 PM

[18p-F2-11] Development of “Life extention of chamber”technology for ArF eximer lasers for semiconductor lithography tools

^○Akira Suwa¹, Hiroyuki Ikeda¹, Hisakazu Katsuumi¹, Takeshi Asayama¹, Hiroaki Tsushima¹, Takahito Kumazaki¹, Akihiko Kurosu¹, Takeshi Ohta¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton¹)

5:15 PM - 5:30 PM

[18p-F2-12] Active-Matrix nc-Si Electron Emitter Array for Massively Parallel Direct-Write EB System (IV)

^○Naokatsu Ikegami¹, Akira Kojima^1,3, Takashi Yoshida², Hitoshi Nishino², Shinya Yoshida², Hiroshi Miyaguchi², Masanori Muroyama², Hideyuki Ohyi³, Nobuyoshi Koshida¹, Masayoshi Esashi² (Tokyo Univ. of Agri. & Tech.¹, Tohoku Univ.², CRESTEC³)

5:30 PM - 5:45 PM

[18p-F2-13] Reduction of Turn-Around-Time in Three-Dimensional EB Lithography

^○Kenji Yamazaki¹, Hiroshi Yamaguchi¹ (NTT Basic Research Labs.¹)

Session information

[18p-F2-1~13] 7.3 Lithography

△ [18p-F2-7] Built-in lens mask lithography I -Proposed and Basic study-