The 61st JSAP Spring Meeting, 2014

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Oral presentation

07. Beam Technology and Nanofabrication » 7.3 Lithography

[18p-F2-1~13] 7.3 Lithography

Tue. Mar 18, 2014 2:00 PM - 5:45 PM F2 (F204)

3:15 PM - 3:30 PM

[18p-F2-5] Photoresist Removal using Ozone Microbubble

Yosuke Goto1, Hitomi Kitamura1, ○Takashi Nishiyama1, Kunihiko Koike2, Hideo Horibe3 (Kanazawa Inst. Tech.1, Iwatani Corp.2, Osaka City Univ.3)

Keywords:オゾン,マイクロバブル,レジスト除去