The 76th JSAP Autumn Meeting, 2015

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Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

[15a-2Q-1~12] 8.4 Plasma etching

Tue. Sep 15, 2015 9:00 AM - 12:15 PM 2Q (231-1)

座長:辰巳 哲也(ソニー),石川 健治(名大)

11:00 AM - 11:15 AM

△ [15a-2Q-8] Layer by layer etching of LaAlSiOx

〇Kazuhito Furumoto1, Kazuhisa Matsuda1, Toshiyuki Sasaki1, Mitsuhiro Omura1, Itsuko Sakai1, Hisataka Hayashi1 (1.Toshiba.Corp.)

Keywords:Etching,High-k