[19p-W621-1~12] 8.4 Plasma etching

△ [19p-W621-6] Hydrogen-damage-layer effects on ITO etching by H₂/Ar plasma

〇Akiko Hirata¹, Masanaga Fukasawa¹, Takushi Shigetoshi¹, Masaki Okamoto¹, Kazunori Nagahata¹, Hu Li², Satoshi Hamaguchi², Tetsuya Tatsumi¹ (1.Sony corp., 2.Osaka Univ.)

Keywords:plasma etching,transparent conductive oxide