Composition ratio dependence of exposure characteristics of positive tone electron beam resist containing <em>p</em>-chloro-<em>α</em>-methylstyrene

Shunsuke Ochiai; Tomohiro Takayama; Yukiko Kishimura; Hironori Asada; Minako Iwakuma; Manae Sonoda; Ryoichi Hoshinno

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Oral presentation

CS Code-sharing session » CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

[14p-423-1~14] CS.4 7. Code-sharing Session: Beam Technology and Nanofabrication

Tue. Mar 14, 2017 1:15 PM - 5:00 PM 423 (423)

Shoji Hotta(Hitachi), Hiroki Yamamoto(Osaka Univ.)

1:30 PM - 1:45 PM

△ [14p-423-2] Composition ratio dependence of exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene

〇Shunsuke Ochiai¹, Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Minako Iwakuma², Manae Sonoda², Ryoichi Hoshinno³ (1.Yamaguchi Univ., 2.NIT, Miyakonojo College, 3.FMS Inc.)

Keywords:non-chemically amplified resist, exposure characteristics, composition ratio

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