9:15 AM - 9:30 AM
[15a-304-2] Fabrication of Sub10nm mask pattern for stencil lithography techniques using Focused Ion Beam
Keywords:Focused Ion Beam, Sub10nm, stencil lithography
Presentation information
Oral presentation
13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
[15a-304-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
Wed. Mar 15, 2017 9:00 AM - 11:30 AM 304 (304)
Minoru Sasaki(Toyota Tech. Inst.)