The 67th JSAP Spring Meeting 2020

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Oral presentation

3 Optics and Photonics » 3.7 Laser processing

[12a-B410-1~8] 3.7 Laser processing

Thu. Mar 12, 2020 9:30 AM - 11:45 AM B410 (2-410)

Masayuki Okoshi(防衛大), Miho Tsuyama(Kindai Univ.)

9:45 AM - 10:00 AM

[12a-B410-2] Curved resist pattern formation using phase difference control in laser photolithography using coaxial interference pattern of optical vortices

〇(M2)Takuya Hizatsuki1, Moritsugu Sakamoto1, Kohei Noda1, Nobuhiro Kawatsuki2, Kimiaki Tsutsui3, Hiroshi Ono1 (1.Nagaoka Univ. of Technol., 2.Hyogo Univ., 3.Nissan Chemical Corp.)

Keywords:optical vortex, photolithography