[17p-PA07-1~9] 6.2 Carbon-based thin films

[17p-PA07-6] Selective Etching of Hydrogen-Free Diamond-Like Carbon Films on Atomic Hydrogen Exposure

〇Yuichi Haruyama¹, Daiki Morimoto¹, Akira Heya², Koji Sumitomo², Noriaki Toyoda², Seigo Ito² (1.LASTI Univ. of Hyogo, 2.Grad. Sch. of Eng. Univ. of Hyogo)

Keywords:diamond-like carbon, atomic hydrogen exposure, selective etching

The effect of atomic hydrogen exposure on the three hydrogen-free diamond-like carbon (DLC) films with different sp³/sp² ratio was investigated by a photoelectron spectroscopy. Although a peak in the C 1s core-level photoelectron spectrum of the hydrogen-free DLC film was located at ~284.4 eV before atomic hydrogen exposure, it shifted at ~285.2 eV after atomic hydrogen exposure. This indicates that the sp² hybridized carbon atoms were selectively etched by atomic hydrogen exposure. In the presentation, we will discuss the details of the selective etching of hydrogen-free DLC films on atomic hydrogen exposure.