[C-2-4] Sub-Quarter Micron Gate Fabrication Process Using Phase-Shifting-Mask for Microwave GaAs Devices

Kazuyuki Inokuchi、Tadashi Saito、Hideyuki Jinbo、Yoshio Yamashita、Yoshiaki Sano (1.Research and Development Group, Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1991.C-2-4