The Japan Society of Applied Physics

[PC-7-4] 650nm-Band High Power AlGaInP Visible Laser Diodes Fabricated by Reactive Ion Beam Etching Using Cl2/N2 Mixture

Isao KIDOGUCHI、Hideto ADACHI、Kiyotake TANAKA、Toshiya FUKUHISA、Masaya MANNOH、Akira TAKAMORI (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1996.PC-7-4