[P-1-18] Negative Bias Temperature Instability (NBTI) of pMOSFETs with Novel HfxMoyNz Metal Gate Electrodes H. K. Peng1、C. S. Lai1、K. M. Fan1、S. J. Lin2 (1.Chang Gung Univ.、2.Nanya Tech. Corp., Taiwan) https://doi.org/10.7567/SSDM.2008.P-1-18