[P-2-6] Vapor Phase Silylation Hardening Process for Porous Silica Low-k Films

Y. Nakata¹、Y. Kayaba¹、T. Hirota²、T. Kikkawa¹ (1.Hiroshima Univ.、2.TAZMO, Inc., Japan)

https://doi.org/10.7567/SSDM.2008.P-2-6