[C-7-2] High-Performance three-terminal FinFETs by Combination of Damage-Free Neutral-Beam Etching and Neutral-Beam Oxidation Technologies

K. Sano¹、M. Yonemoto¹、A. Wada¹、K. Endo²、T. Matsukawa²、M. Masahara²、S. Samukawa¹ (1.Tohoku Univ.(Japan)、2.AIST(Japan))

https://doi.org/10.7567/SSDM.2009.C-7-2