10:45 〜 11:00
▲ [21a-C310-7] Pre-sputtering Condition for Crystallized Yttria Stabilized Zirconia (YSZ) Film Deposition on Cellulose Nanopaper (CNP) by Reactive Sputtering
キーワード：Reactive Sputtering, YSZ, low temperature
Previously, it was found that yttria stabilized zirconia (YSZ) film is quite effective to stimulate crystallization of amorphous Silicon (a-Si) at low temperature. For using the YSZ effect to fabricate electron devices, e.g., TFT, on a flexible substrate and environment friendly material of cellulose nanopaper (CNP), a crystallized YSZ must be deposited without plasma and thermal damage to CNP. Earlier, we have reported that a crystallized YSZ film can be deposited on CNP without any damage using DC magnetron sputtering with Ar and O2. In this meeting, we show that pre-sputtering condition or treatment of target surface before deposition is one of the important factors for deposition of a highly crystallized YSZ film. Films deposited with pre-sputtering at high O2 flow rates, showed better film qualities due to stabilization of discharge conditions.