CLEO-PR2022/ISOM'22/ODF'22

Presentation information

Oral Session

CLEO-PR2022 » QD Devices and Crystal Growth Technology

[CMP11A] QD Devices and Crystal Growth Technology

Mon. Aug 1, 2022 1:30 PM - 3:00 PM Room 104&105 (1F)

Session Chair: Tomohiro Amemiya (Tokyo Tech)

2:30 PM - 2:45 PM

[CMP11A-05] Post Growth Annealing and InGaSb Layer Insertion Effects of Metamorphic InAsSb on GaAs Substrate

*Koki Hombu1, Shota Nakagawa1, Yuto Iwakiri1, Koji Maeda1, Masakazu Arai1 (1. Univ. of Miyazaki (Japan))

[Presentation Style] Onsite

We investigated the effect of post-growth annealing on metamorphic InAsSb on GaAs. The mid-infrared range photoluminescence intensity was improved, however, the surface flatness was deteriorated. The photoluminescence was also improved by inserting the InGaSb layer.