[J401-3am] 07. Inorganic Chemistry

[J401-3am-15] Extremely Rapid Growth of Boron-Doped Diamond by Using In-liquid Microwave Plasma CVD

^○Yusuke Tominaga^1,2, Hiroshi Uetsuka³, Naoya Ishida², Takeshi Kondo^1,2, Makoto yuasa^1,2, Susumu Sato⁴, Akira Fujishima², Chiaki Terashima^1,2 (1. Graduate School of Science and Technology, Tokyo University of Science, 2. Research Center for Space System Innovation, Tokyo University of Science, 3. Asahi Diamond Industrial Co., Ltd., 4. Saitama Institute of Technology)

[Lang.] Japanese

Keywords:Diamond, Boron-doped diamond, Diamond electrode, CVD, In-liquid plasma