[K206-2vn] 20. Materials Chemistry -Basic and Application-

[K206-2vn-11] Expanding boron-doped diamond film by in-liquid microwave plasma CVD

^○Naoaki Kubota^1,2, Hiroshi Uetsuka^2,3, Susumu Sato⁴, Norihiro Suzuki², Chiaki Terashima^1,2 (1. Faculty of Science and Technology, Tokyo University of Science Tokyo, 2. Research Center for Space System Innovation, Tokyo University of Science, 3. Asahi Diamond Industrial Co., Ltd., 4. Faculty of Engineering, Saitama Institute of Technology)

[Lang.] Japanese

Keywords:Boron doped diamond, Chemical Vapor Deposition, Plasma, In-liquid microwave plasma CVD