The 103rd CSJ Annual Meeting

Presentation information

Print

Academic Program [Oral B]

20. Materials Chemistry -Basic and Application- » Oral B

[K206-4am] 20. Materials Chemistry -Basic and Application-

Sat. Mar 25, 2023 9:00 AM - 10:20 AM K206 (K206, Lecture Hall Bldg. [2F])

Chair: Kazuki Sada, Koki Sano

9:40 AM - 10:00 AM

[K206-4am-03] Evaluation of Atomic Oxygen Resistance of POSS film

○Kazuki Yukumatsu1, Aki Goto1, Soichi Yokoyama2, Yutaka Ie2, Yugo Kimoto1 (1. Japan Aerospace Exploration Agency, 2. Osaka University)

[Lang.] Japanese

Keywords:Atomic Oxygen, Polyhedral oligomeric silsesquiozane