The 39th International Conference of Photopolymer Science and Technology

Materials & Processes for Advanced Lithography,

Nanotechnology and Phototechnology
 

In Cooperation with the Technical Association of Photopolymers (Japan), the Chemical Society of Japan, and the Society of Polymer Science (Japan), and endorsed by the Japan Society of Applied Physics

June 28 (Tuesday) - June 30 (Thursday), 2022
 

The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:
 
A. English Symposia
       
A1.    Next Generation Lithography, EB Lithography and Nanotechnology
A2.    Nanobiotechnology
A3.    Directed Self Assembly (DSA)
A4.    Computational / Analytical Approach for Lithography Processes
A5.    EUV Lithography
A6.    Nanoimprint
A7.    193 nm Lithography Extension and EUV HVM Readiness
A8.    Photopolymers in 3-D Printing / Additive Manufacturing
A9.    2D and Stimuli Responsive Materials for Electronics & Photonics
A10.  Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A11.  Chemistry for Advanced Photopolymer Science
A12.  Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A13.  Fundamentals and Applications of Biomimetics Materials and Processes
A14.  General Scopes of Photopolymer Science and Technology
 
P1.    Panel Symposium “Beyond Sub-10 nm Lithography – From a Material Design and Development Perspective –“
 
B. Japanese Symposia
 
B1.    Polyimides and High Temperature Polymers  -Functionalization and Practical Applications-
B2.    Plasma Photochemistry and Functionalization of Polymer Surfaces
B3.    General Scopes of Photopolymer Science and Technology 
 

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