ICSCRM2019

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Growth and Wafer Manufacturing

[Mo-2B] 3C-hetero-epitaxy

Mon. Sep 30, 2019 2:15 PM - 3:30 PM Annex Hall 2 (Kyoto International Conference Center)

2:45 PM - 3:00 PM

[Mo-2B-03] Analysis of Defect-Free Hot Filament CVD-grown 3C-SiC

*Bart Van Zeghbroeck1, Ryan R Brow2, Tomoko Borsa1, David Bobela3 (1. Univ. of Colorado(United States of America), 2. NREL(United States of America), 3. TrueNano Inc(United States of America))