ICSCRM2019

講演情報

印刷

Oral Presentation

Growth and Wafer Manufacturing

[Mo-2B] 3C-hetero-epitaxy

2019年9月30日(月) 14:15 〜 15:30 Annex Hall 2 (Kyoto International Conference Center)

14:45 〜 15:00

[Mo-2B-03] Analysis of Defect-Free Hot Filament CVD-grown 3C-SiC

*Bart Van Zeghbroeck1, Ryan R Brow2, Tomoko Borsa1, David Bobela3 (1. Univ. of Colorado(United States of America), 2. NREL(United States of America), 3. TrueNano Inc(United States of America))