[Tu-P] Poster Presentation

[Tu-P-32] Low-resistance ohmic contact formation by laser annealing of N-implanted 4H-SiC

*Carsten Hellinger¹, Oleg Rusch¹, Mathias Rommel¹, Anton J. Bauer¹, Tobias Erlbacher¹ (1. Fraunhofer Institute for Integrated Systems and Device Technology (IISB)(Germany))