Schedule 2 4:15 PM - 6:15 PM [Tu-P-33] The Ohmic Contact Characteristics of 4H-SiC Power Devices by Plused Laser Annealing and Rapid Thermal Annealing Ziwei Zhou1, Jianyong Hao1, Jun Sun1, *Zhenzhong Zhang1, Weiwei He1, Zedong Zheng2 (1. Shenzhen BASiC Semiconductor Ltd.(China), 2. Department of Electrical Engineering, Tsinghua University(China))