ICSCRM2019

講演情報

Oral Presentation

MOS Gate Stacks and Device Processing

[We-2A] Inversion Layer Transport

2019年10月2日(水) 10:45 〜 12:15 Room A (Kyoto International Conference Center)

12:00 〜 12:15

[We-2A-05] Spatially Resolved Defect Mapping of the SiO2/4H-SiC Interface

*Judith Woerle1,2, Brett Johnson3, Corrado Bongiorno4, Kohei Yamasue5, Gabriel Ferro6, Dipanwita Dutta2, Yasuo Cho5, Ulrike Grossner1, Massimo Camarda2,1 (1. ETH Zurich(Switzerland), 2. Paul Scherrer Institute(Switzerland), 3. University of Melbourne(Australia), 4. IMM-CNR Catania (Italy), 5. Tohoku University(Japan), 6. Université de Lyon(France))