*Boxin ZHANG¹, Soma SATO², Yan LI², Atsutomo NAKAMURA² (1. Osaka Univ., 2. Osaka Univ.)

*Keita GOTO¹, Reona MIYAZAKI², Takehiko HIHARA² (1. Nagoya Institute of Technology (Master), 2. Nagoya Institute of Technology (Doctor))

*Seiya NISHIHARA¹, Reona MIYAZAKI², Takehiko HIHARA² (1. Nagoya Institute of Technology (Master), 2. Nagoya Institute of Technology (Doctor))

*YUMA NASHIKI¹, NARIN SUNTHORNPAN¹, KENTARO KYUNO^1,2 (1. Shibaura Institute of Technology, 2. SIT Center for Next Generation Semiconductor HR)

*Kota CHO¹, Yuta ASANO¹, Kentaro KYUNO^1,2 (1. Shibaura Institute of Technology, 2. SIT Center for Generation Semiconductor Human Resources)

*Tetsujiro ETO¹, Rie Umetsu², Xiao XU³ (1. Kurume Inst. of Tech., 2. IMR, Tohoku Univ., 3. Sch. of Eng., Tohoku Univ.)

*Koshiro TANAKA¹, Takuya SASAKI², Ken NIWA², Masashi HASEGAWA² (1. Nagoya University, 2. Nagoya University)

*Takuya Tsuruta¹, Yi Shuang², Daisuke Ando¹, Yuji Sutou^1,2 (1. Tohoku Univ.(Eng.), 2. Tohoku Univ.(AIMR))

*NORIYUKI OKADA¹, TOSHIYUKI SHIMA¹, MASAAKI DOI¹ (1. Tohoku Gakuin Univ)

*Souta KITAHARA¹, Hironari OKADA¹, Satoshi AWAJI² (1. Tohoku Gakuin Univ.)

*Shuhei Orihara¹, Shuang Yi², Daisuke Ando¹, Yuji Sutou^1,2 (1. Tohoku Univ. (Eng), 2. Tohoku Univ. (AIMR))