Session information

Poster presentation

06. Thin Films and Surfaces » 6.2 Carbon-based thin films

[17a-P15-1~9] 6.2 Carbon-based thin films

Tue. Sep 17, 2013 9:30 AM - 11:30 AM P15 (Davis Memorial Auditorium)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:30 AM - 11:30 AM

[17a-P15-1] Decomposition reaction of tetramethylsilane with RF plasma of Ar

^○Nobuyoshi Mogi¹, Haruhiko Ito¹ (Nagaoka Univ.¹)

9:30 AM - 11:30 AM

[17a-P15-2] Observation of free radicals in the microwave discharge flow C₆H₆/N₂ gas mixture

^○Akira Kojima¹, Hiroki Tsudome¹, Kohtaro Okada¹, Ayumi Yamamoto¹, Haruhiko Ito¹ (Nagaoka Univ.¹)

9:30 AM - 11:30 AM

[17a-P15-3] Synthesis of DLC-Si Films using Plasma Generated by Pulse-Bias Voltage

^○Yuya Tachibana¹, Noriaki Ikenaga¹, Ryouichi Hanaoka¹, Noriyuki Sakudo¹ (Kanazawa Inst.¹)

9:30 AM - 11:30 AM

[17a-P15-4] Emission Spectra of Carbon Nitride Thin Films Deposited at Different RF Powers for Application To White Light Emitting Device

^○Masaki Satake¹, Takashi Okawa¹, Michihito Teramoto², Kunio Itoh², Kenta Kametomo³, Ken-ichi Takarabe³, Kazutoshi Fukui⁴, Shin-ichi Yamamoto¹ (Ryukoku Univ.¹, Tsuyama Nat. College of Tech.², Okayama Univ. of Sci.³, Univ. of Fukui⁴)

9:30 AM - 11:30 AM

[17a-P15-5] Analysing deep level defect in CVD Diamond films

^○Takanori Hori¹, Osamu Maida¹, Toshimichi Ito¹ (Graduate School of Eng, Osaka Univ.¹)

9:30 AM - 11:30 AM

[17a-P15-6] Development of High-Quality Diamond Growth Process Using Microwave Plasma CVD Apparatus with Specific Metal Chamber in Shape

^○Masakazu Miyata¹, Osamu Maida¹, Syouhei Nankou², Toshimichi Ito¹ (Graduate School of Engineering, Osaka Univ.¹, Nisshin Inc.²)

9:30 AM - 11:30 AM

[17a-P15-7] Optimization of device structure suitable for normally-off-type CVD diamond FET with vertical current flow

^○Kazutoshi Mio¹, Osamu Maida¹, Toshimichi Ito¹ (Graduate School of Engineering, Osaka Univ.¹)

9:30 AM - 11:30 AM

[17a-P15-8] Fabrication process suitable for δ P-doped diamond multi-layered film on vicinal (001) substrate using high-power-density microwave plasma CVD method

^○Norimasa Ohashi¹, Osamu Maida¹, Toshimichi Ito¹ (Osaka Univ.¹)

9:30 AM - 11:30 AM

[17a-P15-9] Optimization of fabrication process proposed for fine columnar structure of high-quality CVD diamond and its device application

^○Ryuichi Hashimoto¹, Osamu Maida¹, Toshimichi Ito¹ (Graduate School of Engineering, Osaka Univ.¹)

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