Symposium

[16p-C11-1~12] Challenge of next generation surface control on thehigh end semiconductor device in the industry

Mon. Sep 16, 2013 1:00 PM - 5:15 PM C11 (TC3 2F-210)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:00 PM - 1:30 PM

[16p-C11-1] Challenges of cleaning process design to the device structure using new materials

^○Hayato Iwamoto¹, Suguru Saito², Yoshiya Hagimoto¹ (Sony Corporation¹, Sony Semiconductor Corporation²)

1:30 PM - 2:00 PM

[16p-C11-2] Cleaning Technology for Advanced Semiconductor Memory

^○Yoshihiro Ogawa¹ (Advanced Memory Development Center,Semiconductor&Storage Products Company¹)

2:00 PM - 2:15 PM

[16p-C11-3] Molecular Dynamics Analysis on the Liquid Infiltration into Nanoscale Slit (2nd Report: Effects of Residual Gas)

^○Yasutaka Yamaguchi¹, Satoshi Nakaoka¹, Masayuki Kawakami², Daisaku Yano², Koji Yamanaka² (Osaka Univ.¹, Organo Corp.²)

2:15 PM - 2:30 PM

[16p-C11-4] Mechanism of wet etching in nanoscale region (2)

^○Atsushi Okuyama¹, Suguru Saito¹, Takashi Oinoue², Yoshiya Hagimoto², Hayato Iwamoto² (Sony Semiconductor¹, Sony²)

2:30 PM - 2:45 PM

[16p-C11-5] Behavior of Particles in Supercritical Carbon Dioxid

^○Hiroshi Sugawara¹, Shin-ichiro Kawasaki², Akira Suzuki² (Organo Co.¹, AIST²)

2:45 PM - 3:00 PM

[16p-C11-6] Frictional Analysis of PVA brush for Post CMP Cleaning

^○Toshiyuki Sanada¹, Yoshitaka Hara¹, Akira Fukunaga², Hirokuni Hiyama² (Shizuoka Univ.¹, Ebara Coap.²)

Break （3:00 PM - 3:15 PM）

3:15 PM - 3:45 PM

[16p-C11-7] Problem of wafer cleaning process for impure substance

^○yuya akeboshi¹, kenji narita¹, hideki doushita¹ (Panasonic Corporation¹)

3:45 PM - 4:15 PM

[16p-C11-8] Issues of damage-less wafer cleaning in semiconductor device fabrication

^○Morimitsu Tanaka¹ (RenesasEL¹)

4:15 PM - 4:30 PM

[16p-C11-9] Activity Report of the Water Charge Up WG (2nd stage)

^○Daisaku Yano¹ (ORGANO Corporation¹)

4:30 PM - 4:45 PM

[16p-C11-10] Inline measurement of hydrogen peroxide concentration in CMP slurry using absorption spectroscopy

^○So Takagi¹, Takuya Onoda¹, Yoshihiro Mori¹ (HORIBA Ltd.¹)

4:45 PM - 5:00 PM

[16p-C11-11] Wafer normal temperature cleaner and vacuum dryer

^○Yoshiharu Yamamoto¹ (YMT¹)

5:00 PM - 5:15 PM

[16p-C11-12] Challenge of Single wet clean system

^○Takayuki Toshima¹ (Tokyo Electron Kyushu LTD¹)

Sessions

Symposium » Challenge of next generation surface control on thehigh end semiconductor device in the industry