[16p-A13-1~14] 7.3 Lithography

△ [16p-A13-12] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy

^○（M1）Kazuya Emura¹, Takeo Watanabe¹, Daiju Siono², Yuichi Haruyama¹, Yasuji Muramatu¹, Katsumi Ohmori², Kazufumi Sato², Tetsuo Harada¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹, Tokyo Ohka²)

Keywords:レジスト