[16p-C11-1~12] Challenge of next generation surface control on thehigh end semiconductor device in the industry

[16p-C11-7] Problem of wafer cleaning process for impure substance

^○yuya akeboshi¹, kenji narita¹, hideki doushita¹ (Panasonic Corporation¹)

Keywords:洗浄、ウェットエッチング,イオン注入レジスト除去