[16p-D3-1~13] 6.3 Oxide-based electronics

[16p-D3-1] Epitaxial growth and physical properties of LaVO_xN_y thin films

^○Masahito Sano^1,3, Yasushi Hirose^1,2,3, Shoichiro Nakao^2,3, Chang Yang^1,2,3, Souhei Okazaki^2,3, Tomoteru Fukumura^1,2,3, Satoshi Ishii⁴, Kimikazu Sasa⁴, Daiichiro Sekiba⁴, Katsuyuki Fukutani⁵, Tetsuya Hasegawa^1,2,3 (Tokyo Univ.¹, JST-CREST², KAST³, Tsukuba Univ.⁴, Tokyo Univ.⁵)

Keywords:酸窒化物