Silicon Surface oxidation and Passivation by Remote Induction-Coupled Oxygen Plasma

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Insulator technology

Tue. Sep 17, 2013 9:15 AM - 12:00 PM B5 (TC2 2F-201)

10:00 AM - 10:15 AM

Toshiyuki Sameshima¹, Masahiko Hasumi¹, Shinya Yoshidomi¹, Tomohiko Nakamura¹, ^○(B)Satoshi Shigeno¹ (TUAT¹)

Keywords:passivation