The 74th JSAP Autumn Meeting,2013

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Oral presentation

13. Semiconductors A (Silicon) » 13.3 Insulator technology

[17a-B5-1~10] 13.3 Insulator technology

Tue. Sep 17, 2013 9:15 AM - 12:00 PM B5 (TC2 2F-201)

10:15 AM - 10:30 AM

[17a-B5-5] Dependence of Oxide Hole Trap Density on Si Surface Orientation

○(M2)Keisuke Umeda1,3, Keitaro Okada2,3, Daisuke Kobayashi3, Hiroshi Nohira1, Kazuyuki Hirose3 (Tokyo City Univ.1, Waseda Univ.2, ISAS/JAXA3)

Keywords:XPS,Trap,Si