SiC Epitaxial Reactor Cleaning Method Using Chlorine Trifluoride Gas

Presentation information

Oral presentation

15. Crystal Engineering » 15.6 IV-group-based compounds

Tue. Sep 17, 2013 1:30 PM - 6:00 PM B3 (TC2 1F-105)

4:00 PM - 4:15 PM

Yusuke Fukumoto¹, ^○Kosuke Mizuno¹, Hitoshi Habuka¹, Yuki Ishida², Toshiyuki Ohno² (Yokohama Nat. Univ.¹, FUPET²)

Keywords:リアクタクリーニング