The 74th JSAP Autumn Meeting,2013

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Oral presentation

15. Crystal Engineering » 15.6 IV-group-based compounds

[17p-B3-1~17] 15.6 IV-group-based compounds

Tue. Sep 17, 2013 1:30 PM - 6:00 PM B3 (TC2 1F-105)

4:30 PM - 4:45 PM

[17p-B3-12] Development of Silicon Carbide Etching Reactor Using Chlorine Trifluoride Gas (2)

○Dairi Yajima1, Hitoshi Habuka1, Tomohisa Kato2 (Yokohama Nat. Univ.1, AIST2)

Keywords:ClF3