[17p-D1-1~18] 6.2 Carbon-based thin films

[17p-D1-10] Chemical vapor deposition of hydrogenated amorphous carbon films using rf plasma with application of pulse bias voltage

^○Xiaolong Zhou¹, Keiji Komatsu¹, Ikumi Toda¹, Shigeo Ohshio¹, Hiroyuki Muramatsu¹, Hidetoshi Saitoh¹ (Nagaoka Univ. Tech.¹)

Keywords:高周波プラズマ化学気相析出法,パルスバイアス電圧,水素化アモルファス炭素膜