Influence of gas flow rate on quality of Si deposition by non-equilibrium plasma CVD

Presentation information

Poster presentation

08. Plasma Electronics » 8 Plasma Electronics(poster)

Tue. Sep 17, 2013 1:30 PM - 3:30 PM P2 (Davis Memorial Auditorium)

1:30 PM - 3:30 PM

^○Masahito Iseki¹, Satoshi Nishida¹, Hiroshi Muta¹, Shizuma Kuribayashi¹ (Gifu Univ.¹)

Keywords:非平衡プラズマジェット,ガス流速