Measurement of Sputtering Processing Plasma using Powder Target by Langmuir Probe

Hiroharu Kawasaki

Presentation information

Poster presentation

08. Plasma Electronics » 8 Plasma Electronics(poster)

[17p-P2-1~49] 8 Plasma Electronics

Tue. Sep 17, 2013 1:30 PM - 3:30 PM P2 (Davis Memorial Auditorium)

1:30 PM - 3:30 PM

[17p-P2-7] Measurement of Sputtering Processing Plasma using Powder Target by Langmuir Probe

^○Hiroharu Kawasaki¹, Daichi Taniyama¹, Satoshi Takeichi¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Yuki Tanaka¹, Yoshiaki Suda¹ (Sasebo National College of Tech.¹)

Keywords:Powder target,Plasma process

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