[18a-C1-1~5] 8.3 Plasma deposition of thin film and surface treatment

△ [18a-C1-5] Effects of substrate bias on film structures of amorphous carbon films grown by plasma-enhanced chemical vapor deposition system

^○Masayuki Nakamura¹, Lingyun Jia¹, Da Xu¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

Keywords:amorphous carbon,a-C