The 74th JSAP Autumn Meeting,2013

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[18a-C2-1~8] 8.4 Plasma etching

Wed. Sep 18, 2013 9:30 AM - 11:45 AM C2 (TC3 1F-102)

9:30 AM - 9:45 AM

[18a-C2-1] Dissociation paths caused by electron collisions for fluoromethanes

Toshio Hayashi1, Kenji Ishikawa1, Makoto Sekine1, Masaru Hori1 (Nagoya University1)

Keywords:Dissociation paths,fluoromethanes,high energy excited states