Real-time / In-situ Electron Spin Resonance Analysis of Chemical Reactions on Silicon-Nitride with CF<sub>4</sub> Gas Plasma

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Wed. Sep 18, 2013 9:30 AM - 11:45 AM C2 (TC3 1F-102)

10:45 AM - 11:00 AM

^○(PC)Yudai Miyawaki¹, Haoran Wang¹, Yusuke Kondo¹, Kenji Ishikawa¹, Keigo Takeda¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹)

Keywords:Electorn Spin Resonance,Silicon Nitride,Etching