[18p-C1-1~13] 13.2 半導体表面

▲ [18p-C1-6] Investigation of Si(110) surface roughness on MOS capacitor with ultrathin HfON gate insulator formed by ECR plasma sputtering

^○Dae-Hee Han，Shun-ichiro Ohmi (東工大)

キーワード：surface roughness