[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-1] Recent Trends of HiPIMS – The high-power pulse drive of a sputtering source -

^○Kingo Azuma¹ (Univ. Hyogo¹)

Keywords:ハイパワ-パルススパッタリング,金属プラズマ,プラズマイオンプロセス