4:45 PM - 5:00 PM
△ [18p-C5-6] Development of Magnet-Free Sputtering System for Oxide Thin Film by Microwave Plasma
Keywords:スパッタリング
Presentation information
Symposium
Symposium planned by Program Committee » Possibilities of reactive deposition process by high power impulse magnetron sputtering
[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering
Wed. Sep 18, 2013 2:00 PM - 6:15 PM C5 (TC3 1F-115)