^○Hisato Ogiso^1,2, Shizuka Nanano^1,2, Ken Yukimura¹, Akihiko Kato^2,3, Yuki Yabuta^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (AIST¹, Minimal², Seinan³)

5:45 PM - 6:15 PM

[18p-C5-8] HiPIMS-The future of materials processing created by high density metal plasma

^○Takashi Ikehata¹ (Ibaraki Univ.¹)

Sessions

Symposium planned by Program Committee » Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-1] Recent Trends of HiPIMS – The high-power pulse drive of a sputtering source -

[18p-C5-2] Film structure modification by ionized metal species in High Power Pulsed Magnetron Sputtering

[18p-C5-3] Comparison of the plasma ion processes at industrial scale

[18p-C5-4] High Density Production of Carbon Ions by High Power Impulse Magnetron Sputtering

[18p-C5-5] Industrial Applications of Carbon Films using High Power Pulse Magnetron Sputtering Process

△ [18p-C5-6] Development of Magnet-Free Sputtering System for Oxide Thin Film by Microwave Plasma

[18p-C5-7] The Small HIPIMS Plasma Source and the Application for Minimal Fab

[18p-C5-8] HiPIMS-The future of materials processing created by high density metal plasma