[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-3] Comparison of the plasma ion processes at industrial scale

^○Satoshi Hirota¹, Rainer Cremer², Tetsuya Takahashi² (Kobe Steel¹, KCS²)

Keywords:イオン化、ハイピムス、スパッタ、大電力