[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-2] Film structure modification by ionized metal species in High Power Pulsed Magnetron Sputtering

^○Takeo Nakano¹, Shigeru Baba¹ (Seikei Univ.¹)

Keywords:スパッタリング,薄膜構造,プラズマ