The 74th JSAP Autumn Meeting,2013

Presentation information

Symposium

Symposium planned by Program Committee » Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

Wed. Sep 18, 2013 2:00 PM - 6:15 PM C5 (TC3 1F-115)

3:45 PM - 4:15 PM

[18p-C5-4] High Density Production of Carbon Ions by High Power Impulse Magnetron Sputtering

Takashi Kimura1 (Nagoya Inst. of Tech.1)

Keywords:カーボンスパッタ,パルス放電,成膜プロセス