The 74th JSAP Autumn Meeting,2013

Presentation information

Symposium

Symposium planned by Program Committee » Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

Wed. Sep 18, 2013 2:00 PM - 6:15 PM C5 (TC3 1F-115)

5:45 PM - 6:15 PM

[18p-C5-8] HiPIMS-The future of materials processing created by high density metal plasma

Takashi Ikehata1 (Ibaraki Univ.1)

Keywords:プラズマ,スパッタリング,薄膜